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МЕХАНИЗМ ДЕФЕКТООБРАЗОВАНИЯ В ЭПИТАКСИАЛЬНЫХ ПЛЕНКАХ ТВЕРДЫХ РАСТВОРОВ SI1-ХSNХ (0≤Х≤0.04)

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MAQOLA ANNOTATSIYASI

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Maqolada suyuq fazali epitaksiya usulida pSi taglikka, chekli hajmli qalayli qorishma-eritmadan o’stirilgan Si1-xSnx qattiq eritmalarining strukturaviy xususiyatlarini o’rganish natijalari keltirilgan. Qalay atomlari uyushmalari hosil bo’lishida va o’zaro mos kelmovchi dislokatsiyalarning paydo bo’lishi sababli yuzaga keluvchi mexanik kuchlanishlarning qiymatlari hisoblangan. Olingan natijalarning tahlilidan qalay atomlari uyushmalari hosil bo’lishida yuzaga keluvchi elestik mexanik kuchlanish o’zaro mos kelmovchi dislokatsiyalarning paydo bo’lishiga sabab bo’lishi aniqlandi.

MUALIFLAR

Teglar

# solid solution# твердый раствор# микроструктура# microstructure# эпитаксиальная пленка# dislocation# epitaxial fi lm# qattiq eritma# epitaksial qatlam# mikrostruktura# elastik kuchlanish# uyushma# dislokatsiya# упругие напряжения# скопления# дислокация# elastic stresses# clusters

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Maqola idintifikatorlari

Foydalanilgan adabiyotlar

1. Korolyuk Y.G., Deibuk V.G., Vyklyuk Ya.I. Optical properties of dicordeed diamond-like solid substitutional solutions Ge1−xSix, Ge1−xSnx, Si1−xSnx, Si1−xCx and their thin fi lms // Journal of physical studies. – 2004. – Vol. 8, №1. – P. 77 – 83. 2. Möck P., Lei Y., Topuria T., Browning N.D., Ragan R., Min K.S., Atwater H.A. Endotaxial growth mechanisms of Sn Quantum Dots in Si matrix // Materials Research Society Symposium Proceedings – 2003. – Vol. 770. – P. I1.7.1 – 1.7.4. 3. Сапаев Б., Саидов М.С., Саидов А.С., Каражанов С.Ж. Твердые растворы (С 2 IV )1-х(АIIIBV)x, полученные из ограниченного объема оловянного раствора-расплава // Физика и техника полупроводников. – 2004. – Том. 36, № 11. – С. 1285 – 1293. 4. Saidov A.S., Usmonov Sh.N., Kalanov M., Madaminov X.M. Structure and photoelectric properties of Si1-xSnx epiplayers // Technical physics letters. – 2010. – Vol. 36, No. 9. – P. 827 – 829. 5. Trumbore F.A., Isenberg C.R. and Porbansky E.M. On the temperature-dependence of the distribution coeffi cient: The solid solubilities of tin in silicon and germanium // Journal of Physics and Chemistry of Solids. – 1959. – Vol. 9. – P. 60. 6. Deibuk V.G., Korolyuk Yu.G. The eff ect of strain on the thermodynamic properties of Ge-Si, Ge-Sn, Si-Sn, Si-C thin solid fi lms // Semiconductor Physics, Quantum Electronics and Optoelectronics. – 2002. – Vol. 5, No 3. – P. 247 – 253. 7. Laurence J.E. Diff usion-induced stress and lattice disorders in silicon // Journal of the Electrochemical Society. – 1996. – Vol. 113. – P. 819. 8. Yagi K., Miyamoto N., Nishizawa J. Anomalous diff usion of phosphorus into silicon // Japanese Journal of Applied Physics. – 1970. – Vol. 9. – P. 246. 9. Prussin S.. Generation and distribution of dislocations by solute diff usion // Journal of Applied Physics. – 1961. – Vol. 32. – P. 1876.

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