1. Djemilov H.X. Statistical Mechanism of the Formation of the Energy Spectra of Sputtered Molecular Clusters2012. № 8. С. 28-34; Journal of Surfase Investigation. X-ray, Synchrotron and Neutron Techniques., 2012.V.6.№4.Р. 654-659. 2. Wucher A. Mat. Fys. Medd. Dan. Vidensk. Selsk. 2006. V. 52. P. 405. 3. Urbassek H.M. Hofer W.O. // Mat. Fys. Medd. Dan. Vidensk. Selsk. 1993. V. 43. P. 97. 4. Bekkerman А.D. Веrеvkin I.B. Verxoturov S.V. Дjеmilev, H.X. Маksimov S.E. Sоlоmkо.V.V. Izvestiya ran seriya fiz. 1996. Т. 60. №6. S. 121-127. 5. Djemilov H.X., Кovalenka S.F., Маksimov S.Е., Тukfatulillin О.F., Хоjiev SH.Т. Poverxnosti. Rentagen, Sinxrotr, i Neytron. Issled 2015. № 4. S. 89-94. 6. Deng H.N Kerns K.P. Jr. Castelman A.W. Phys.Chem J: Mechanism of the Formation of the Energy Spectra of Sputtered Molecular Clusters on NbnOm+. 1996. V.100.P.1338-1339. 7. Bekkerman A.D., Dzhemilev N.Kh., Rotstein V.M. Surf. Interface. Anal. The differences in the yield dependences of Si2 ions with n =1—3 on the oxygen pressure.1990. V. 15. P 587-590. 8. Djemilov H.X., Кovalenka S.F., Маksimov S.Е., Хоjiev SH.Т. Kinetics and Mechanism of Gas-Phase Reactions. Poverxnosti. Rentagen., Sinxrotr., i Neytron. Issled. 2014. № 10. S. 108-112. 9. Poverxnosti. Rentagen., sinxrotr., i neytron. Issled Тukfatulillin О.F., Хоjiev SH.Т. V kn. On the Unimolecular Decay and Mechanism of Formation of Si+ Cluster Ions «Теzis daklodov ХLV mеjdnarodnoy Тulininovskoy po fizike chastis s kristallamii (Мoskiva 26 mаy-28 mаy 2015) » Моskvа 2015. S. 138. 10. Хоjiev SH.Т., Djemilov H.X., Кovalenka S.F., Маksimov S.Е. Тukfatulillin О.F., Study of The Formation And Unimolecular Fragmentation Nbn Om+..Uzbekistan fizicheskiy jurnal. 2010.Т.12. № 1-2. S. 96-102. 11. Маksimov.S.Е., Djemilov H.X.,., Кovalenka S.F., Тukfatulillin О.F., Хоjiev Sh.Т Izn. Ran. Sеr. fiz. 2014. Т. 78. № 6. S. 710-713. 12. Paul B. Zbar and Albert P. Malvino, Basic Electronics: Sputtering of solids by ion bombardment, in Sputtering by Particle Bombardment. A Text – Lab Manual, 5th edition, Tata McGraw-Hill Publisher, 2005. 13. Klots C.E and J.Chen // Phys. Energy distribution of Si n Om clusters. A Text – Lab Manual, 5th edition, Tata McGraw-Hill Publisher, 2006. 14. Urbassek H.M., Michl J.// nucl//instr. Meth: Investigation of the processes of the formation, emission and fragmentation of sputtered Si. 1995.B22.P 26-36. 15. Gerhard W.//Z.Phys., Surf. Invest.: X-ray, Synchrotron Neutron tech patterens in Nanotechnology. B22. P.31-39 (2014). 16. Moshfehg A.Z//J.Phys D. Surface investigation. x-ray, synchrotron and neutron techniques Vol. 9 No. 2. 2015. 17. Klots C.E and J.Chen. Phys: Studies of the dependences of the cluster Si+O2 ion yields and the intensities of their unimolecular decay on the oxygen. 1991.D21.P.335-342. 18. Castleman A.W.Jr., Bowen K.H.//J.Phys.CHem: Dependence of the O+, Si+, SiO1+, SiO2+, and SiO3+ ion yields on the О2 pressure. 1996.100. p. 1291-12944. 19. Wucher A., Wahl M. //Nucl.Instr. Meth.B: Investigation of the dependences of the emission and unimolecular fragmentation of sputtered silicon (Si) clusters. 1998.115. P. 581-589.