| Title | CoAuthors | Main Language | Views | Readings |
|---|---|---|---|---|
| DEFECT FORMATION DURING LOW-TEMPERATURE ANNEALING OF SILICON DOPED WITH ION IMPURITIES Физика полупроводников и микроэлектроника | Utamuradova S.B. | Ingliz | 463 | |
| INFLUENCE OF HIGH RADIATION DOSES ON THE BEHAVIOR OF TRANSITION ELEMENT IMPURITIES IN SILICON Физика полупроводников и микроэлектроника | Utamuradova S.B. | Ingliz | 249 |